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KODAK PROFESSIONAL Technical Pan Film • P-255 11
0.58
0.64
0.48
0.70
Index
Contrast
25
20
16
25
Exposure
Index
11
9
7
5
Time (min)
Developing
5 min =0.50
11 min =0.70
7 min =0.60
9 min =0.65
Process:
Exposure:
Developer 5, 7, 9, and 11 minutes at
Small tank, KODAK TECHNIDOL Liquid
Daylight, 1/25 second
68 F (20 C), agitation at 30-second intervals
LOG EXPOSURE (lux-seconds)
3.0
0.0
2.0
DENSITY
1.0
2.0
3.0
4.0
1.0
0.0 1.0
F002_0193AC
0.50
DEVELOPMENT TIME
0.40
7
(minutes)
1159
CONTRAST
0.70
0.60
INDEX
10 min =2.00
12 min =2.50
6 min =1.20
8 min =1.50
Process:
Exposure:
6, 8, 10, and 12 minutes at 68 F (20 C),
Small tank, KODAK Developer D-76;
Tungsten, 1/25 second
agitation at 30-second intervals
F002_0186AC
INDEX
EXPOSURE
INDEX
CONTRAST
125
100
1210
50
75
86
GAMMA
1.00
1.25
1.50
1.75
2.00
DEVELOPMENT TIME
(minutes)
1.00.01.0
4.0
3.0
2.0
1.0
DENSITY
2.0
0.0
3.0
LOG EXPOSURE (lux-seconds)
DENSITY
KODAK VERSAMAT Film Processor,
Daylight, 1/25 second
KODAK VERSAMAT 641 Chemicals at
5, 10, 15, 20, and 25 ft/min at 85 F (29.4 C);
Exposure:
Process:
5 fpm =2.90
10 fpm =1.55
15 fpm =1.30
20 fpm =1.05
25 fpm =0.85
Model 11; 1 developer rack
LOG EXPOSURE (lux-seconds)
3.0
0.0
2.0
DENSITY
1.0
2.0
3.0
4.0
1.0
0.0 1.0
(fpm)
MACHINE SPEED
2.20
1.80
1.40
1.00
0.60
510
100
50
15 20
150
200
CONTRAST
INDEX
EXPOSURE
INDEX
25
F002_0191AC
Model 11; 1 developer rack
25 fpm =1.35
20 fpm =1.60
15 fpm =2.20
10 fpm =2.80
5 fpm =3.60
Process:
Exposure:
Chemicals at 85 F (29.4 C); KODAK
KODAK VERSAMAT 885
Daylight, 1/25 second
VERSAMAT Film Processor,
LOG EXPOSURE (lux-seconds)
3.0
0.0
2.0
DENSITY
1.0
2.0
3.0
4.0
1.0
0.0 1.0
(fpm)
MACHINE SPEED
2.60
2.20
1.80
1.40
1.00
510
150
100
15 20
200
250
CONTRAST
INDEX
EXPOSURE
INDEX
25
F002_0190AC
LOG EXPOSURE (lux-seconds)
3.0
0.0
2.0
DENSITY
1.0
2.0
3.0
4.0
1.0
0.0 1.0
(fpm)
MACHINE SPEED
2.20
1.80
1.40
1.00
0.60
510
100
50
15 20
150
200
CONTRAST
INDEX
EXPOSURE
INDEX
F002_0192AC
KODAK VERSAMAT Film Processor,
Daylight, 1/25 second
KODAK DURAFLO RT Developer at
5, 10, 15, and 20 ft/min at 85 F (29.4 C);
Exposure:
Process:
5 fpm =2.40
10 fpm =1.60
15 fpm =1.00
20 fpm =0.80
Model 11; 2 developer racks